Skip to content

Research

Spin defects in hexagonal boron nitride

Point defects in wide-bandgap and two-dimensional materials, and engineering optically addressable spin defects for quantum sensing and quantum information.

Q-Sim Laboratory, Rutgers UniversityAdvisor: Prof. Shaowen ChenSept 2025 – Present

Abstract

The negatively charged boron vacancy, VB⁻, is an optically addressable spin defect in hexagonal boron nitride (hBN). Its spin state can be read out with light at room temperature, and because hBN is a layered crystal a few nanometers thick, the defect can sit almost directly against whatever it is measuring. The project creates these defects deliberately, by irradiating exfoliated flakes with an ion beam and checking the result with confocal photoluminescence and optically detected magnetic resonance. Alongside the measurements, I wrote the PL analysis pipeline and bench tools for PL and AFM data, and I have been building Monte Carlo ion-transport simulations to choose beam conditions for future irradiations.

§1Why boron vacancies

Diamond NV centers made quantum sensing practical, but they sit inside a bulk crystal, which limits how close they get to a sample. VB⁻ lives in a van der Waals material that can be thinned to a few layers and stacked directly onto other 2D materials. Its ground state is a spin triplet, described by

H=D[Sz2−13S(S+1)]+E(Sx2−Sy2)+gμB B⋅S,S=1.\begin{aligned} H &= D\left[S_z^2 - \tfrac{1}{3}S(S+1)\right] + E\left(S_x^2 - S_y^2\right) \\ &\quad + g\mu_B\,\mathbf{B}\cdot\mathbf{S}, \qquad S = 1. \end{aligned}

At zero field the ms=±1m_s = \pm 1 levels sit about 3.48 GHz above ms=0m_s = 0. The two levels differ in how brightly the defect fluoresces, so sweeping a microwave drive across the resonance shows up as a dip in photoluminescence. A magnetic field along the c-axis splits that dip into two:

ν±≈Dh±(Eh)2+(γeBz)2.\nu_\pm \approx \frac{D}{h} \pm \sqrt{\left(\frac{E}{h}\right)^2 + \left(\gamma_e B_z\right)^2}.

Reading the splitting gives the local field. Strain and temperature move DD, which turns the same defect into a sensor for those too. None of that matters until the defects exist in the right density, which is where my work starts.

§2Making defects

Boron vacancies form when an incoming ion knocks a boron atom out of the lattice. Our first samples were exfoliated hBN flakes on SiO₂/Si, mapped with confocal photoluminescence (PL), irradiated with a 2 MeV ion beam in the Rutherford backscattering (RBS) chamber, and mapped again.

The first trial, a 30-minute exposure, did not raise PL at all. Typical intensities dropped from roughly 120–160 to 70–110 (arbitrary units). The second trial ran for 11 hours. Afterward the maps showed isolated bright spots that stayed in the same places across repeated scans, which rules out transient noise. The overall comparison is mixed: a few irradiated maps are far brighter than anything before dosing, but they contain fewer bright clusters.

PL intensity alone cannot say whether a bright spot is VB⁻ or some other emitter. That needs a spin measurement (§5). Choosing beam energy and dose more deliberately is what the simulation work in §3 is for.

Five confocal photoluminescence maps of hBN with bright spots marked
Fig. 2Confocal PL maps recorded November 11–12, 2025, around the second irradiation trial. Color is PL intensity in counts; red × marks bright spots found by the clustering step of the analysis pipeline.

§3Simulating the beam

SRIM/TRIM follows individual ions through a target and tallies every displaced atom. I ran four campaigns on a 10 nm hBN film over SiO₂: a helium baseline (A), a helium energy sweep from 1 to 30 keV (B), a proton sweep (C), and a check on whether an ordinary RBS measurement at MeV energies creates unintended vacancies (D). A parser turns the raw SRIM tables into vacancy depth profiles and per-ion yields, then into fluence tables.

For a boron vacancy yield YBY_B (vacancies per incident ion inside the film) and boron areal density NBN_B, damage grows linearly with fluence Φ\Phi:

DPA(Φ)=Φ YBNB,NB≈5.1×1016 cm−2 (10 nm film).\mathrm{DPA}(\Phi) = \frac{\Phi\, Y_B}{N_B}, \qquad N_B \approx 5.1\times10^{16}\ \mathrm{cm^{-2}}\ \text{(10 nm film)}.

The useful results: low-energy helium does most of its damage inside the film. At 3 keV each ion leaves about 3.2 boron vacancies in 10 nm of hBN, while at 30 keV most of the cascade lands in the substrate and the yield falls to about 0.5 (panel C). SRIM shows no substrate contamination of the film anywhere in the sweep (panel D). Film thickness matters: the same 3 keV beam yields 15.1 vacancies per ion in a 50 nm film (panel E). At 1014 cm−210^{14}\ \mathrm{cm^{-2}}, 3 keV helium reaches about 6×10−36\times10^{-3} DPA, just under the overdamage line (panel F).

Six-panel SRIM analysis: vacancy profiles, stopping distribution, vacancies per ion, contamination, film thickness comparison, DPA versus fluence
Fig. 3SRIM campaign summary for He⁺ in 10 nm hBN on SiO₂. (A) Boron and nitrogen vacancy depth profiles. (B) Ion stopping distributions. (C) Boron vacancies per ion versus energy. (D) Substrate contamination. (E) 10 nm versus 50 nm films at 3 keV. (F) DPA versus fluence.

Alongside SRIM I built a classifier that takes an ion, energy, and fluence and places the result in a damage regime: below threshold, sparse, dense, or overdamaged. It also returns the closest matches from a table of about 20 published irradiation experiments. An earlier version also estimated spin observables; the current one reports only the damage regime and the literature matches.

§4Characterization and tooling

I wrote the analysis code for our PL data. The pipeline crops each map to its real scan area, fits and clusters bright spots, and compares conditions. It replaced a dozen one-off scripts, and every past analysis can now be rerun from raw data with one command. An early version distorted the data in a way that looked fine: I had tuned it to look right before I understood the physics well enough to judge it. The rebuilt version is the one I use now.

For the July 2026 sample of 23 flakes, between 10 and 231 nm thick, I wrote two bench tools. One overlays PL maps on optical images and averages PL over hand-drawn flake outlines. The other reads NT-MDT .mdtAFM files directly, with no Gwyddion dependency, then levels them, measures each flake's height above the substrate, and computes ISO 25178 roughness. Both write to the same per-flake sheet.

AFM height map of an hBN flake with step edges and folds
Fig. 4AFM height map of an exfoliated hBN flake (40 µm scan), read and leveled by the AFM tool. Terraces, folds, and residue are visible.
Scatter plot of flake optical hue against AFM thickness for 16 flakes
Fig. 5Optical hue versus AFM thickness for 16 flakes. Color is not monotonic in thickness, because thin-film interference on SiO₂/Si cycles through hues, so color alone cannot stand in for AFM.

§5ODMR: in progress

The test that matters is ODMR: a PL dip near 3.48 GHz that splits in a magnetic field is the signature of VB⁻ and nothing else. In July 2026 we swept 3.3–3.8 GHz on a roughly 50 nm flake using QICK-based microwave control. So far no resonance has risen above the noise. Getting one is the focus of the current semester.

§6Reports and mentoring

  • Report

    Defect Generation in Hexagonal Boron Nitride (PL Scan 2, revised figures)

    Q-Sim Lab, Rutgers · Jan 2026

  • Report

    Defect Generation in Hexagonal Boron Nitride (second irradiation trial)

    Q-Sim Lab, Rutgers · Nov 2025

  • Mentor

    Aresty-funded undergraduate researcher

    Summer 2026 · onboarding onto the hBN project: ODMR, sample preparation, and SRIM

Reports are internal to the group.